Removes dissoved Oxygen/CO2 during Point of Use of the semiconductor and electronics industries or main water processing system
- Removes dissoved Oxygen and Nitrogen in Makeup / Polishing line
- Removes CO2 gas for improved efficiency of ion exchange beds
- Removes CO2 gas to improve EDI performance
- Use in functional water and antistatic equipments by injecting CO2
Gassing and degassing of carbondioxide, injecting nitrogen gas in drinks industry